台式化学机械研磨抛光设备

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• 更新时间：2023-04-11

产品简介：

CMP Tribo 台式化学机械研磨抛光设备,The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions.

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CMP Tribo 台式化学机械研磨抛光设备简介：

The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions. Primary application areas for the Tribo system are in the field of CMP planarization or delayering,

with secondary applications in the field of Tribological science and research.

CMP Tribo 台式化学机械研磨抛光设备特点：

Ø Superior real time analytical capabilities

Ø Consistent, repeatable performance

Ø Enhanced control at your fingertips

Ø Adaptable and portable - Logitech quality as standard