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柜式化学机械研磨抛光设备
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- 更新时间：2023-04-11
CMP Orbis 柜式化学机械研磨抛光设备，The Orbis CMP system is a precision engineered, floor standing CMP tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum ....
CMP Orbis 柜式化学机械研磨抛光设备简介：
The Orbis CMP system is a precision engineered, floor standing CMP tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced processing performance.
CMP Orbis 柜式化学机械研磨抛光设备特点：
l Multi use processing capability
l Low cost solution – high value results
l Advanced design configuration
l Flexible use of operation
l Consistent, reliable yields
l Enhanced ease of use
CMP Orbis
