您现在位置:首页>产品中心>Logitech精密材料表面处理>化学抛光设备>CP4000化学抛光机
CP4000化学抛光机
- 浏览次数:4070
- 更新时间:2023-04-11
产品简介:
Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......
Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.
The CP4000 has been designed exactly for this application, and utilises a chemical etch polishing process to produce high quality results with minimal subsurface damage.
Ø Corrosive Resistant Construction
Ø Workdecks
Ø Polishing Plate
Ø Industry Standard System Architecture
上一个:CMP Orbis柜式化学机械研磨抛光设备 下一个:AWS1线切割机